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Study of post annealing influence on structural, chemical and electrical properties of ZTO thin films

dc.contributor.authorJain, Vipin Kumar
dc.contributor.authorKumar, Praveen
dc.contributor.authorKumar, Mahesh
dc.contributor.authorJain, Praveen
dc.contributor.authorBhandari, Deepika
dc.contributor.authorVijay, Y.K.
dc.date.accessioned2021-10-11T11:23:19Z
dc.date.available2021-10-11T11:23:19Z
dc.date.issued2011
dc.description.abstractTCO semiconductors such as indium tin oxide (ITO), SnO2, ZnO have been studied and used technologically for more than 50 years because of their good optical and electrical properties in combinationen_US
dc.identifier.citationVipin Kumar Jain, Praveen Kumar , Mahesh Kumar , Praveen Jain, Deepika Bhandari , Y.K. Vijay Study of post annealing influence on structural, chemical and electrical properties of ZTO thin filmsen_US
dc.identifier.urihttp://hdl.handle.net/123456789/5086
dc.language.isoenen_US
dc.publisherJournal of Alloys and Compounds 509 (2011) 3541–3546en_US
dc.subjectTCO Semiconductorsen_US
dc.titleStudy of post annealing influence on structural, chemical and electrical properties of ZTO thin filmsen_US
dc.typeArticleen_US

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